Tailoring of microstructure in hydrogenated nanocrystalline Si thin films by ICP-assisted RF magnetron sputtering

Tailoring of microstructure in hydrogenated nanocrystalline Si thin films by ICP-assisted RF magnetron sputtering

© 2015 IOP Publishing Ltd. Utilizing plasma-assisted deposition by combining an RF magnetron and an inductively coupled plasma (ICP) source it is possible to fabricate highly crystallized nc-Si:H films at a relatively low substrate temperature (300 °C). Microstructural analysis reveals enhancement i...

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Bibliographic Details
Main Authors: Kyung Sik Shin, Bibhuti Bhusan Sahu, Manish Kumar, Komgrit Leksakul, Jeon Geon Han
Format: Journal
Published: 2018
Subjects:
Materials Science
Physics and Astronomy
Online Access:https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84947093700&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/54598
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Institution: Chiang Mai University

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https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84947093700&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/54598

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