Tailoring of microstructure in hydrogenated nanocrystalline Si thin films by ICP-assisted RF magnetron sputtering

Tailoring of microstructure in hydrogenated nanocrystalline Si thin films by ICP-assisted RF magnetron sputtering

© 2015 IOP Publishing Ltd. Utilizing plasma-assisted deposition by combining an RF magnetron and an inductively coupled plasma (ICP) source it is possible to fabricate highly crystallized nc-Si:H films at a relatively low substrate temperature (300 °C). Microstructural analysis reveals enhancement i...

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Main Authors: Kyung Sik Shin, Bibhuti Bhusan Sahu, Manish Kumar, Komgrit Leksakul, Jeon Geon Han
Format: Journal
Published: 2018
Subjects:
Materials Science
Physics and Astronomy
Online Access:https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84947093700&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/54598
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Institution: Chiang Mai University
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spelling th-cmuir.6653943832-545982018-09-04T10:25:37Z Tailoring of microstructure in hydrogenated nanocrystalline Si thin films by ICP-assisted RF magnetron sputtering Kyung Sik Shin Bibhuti Bhusan Sahu Manish Kumar Komgrit Leksakul Jeon Geon Han Materials Science Physics and Astronomy © 2015 IOP Publishing Ltd. Utilizing plasma-assisted deposition by combining an RF magnetron and an inductively coupled plasma (ICP) source it is possible to fabricate highly crystallized nc-Si:H films at a relatively low substrate temperature (300 °C). Microstructural analysis reveals enhancement in crystallinity along with (2 2 0) preferential orientation throughout the depth of the film. The possible mechanism of crystallinity enhancement and preferential orientation is presented on the basis of plasma diagnostics using optical emission spectroscopy and various film analysis tools. This work also reports the effectiveness of the ICP source and elevated temperature for the control of film microstructure and crystallinity. 2018-09-04T10:17:33Z 2018-09-04T10:17:33Z 2015-10-26 Journal 13616463 00223727 2-s2.0-84947093700 10.1088/0022-3727/48/47/475303 https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84947093700&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/54598
institution Chiang Mai University
building Chiang Mai University Library
country Thailand
collection CMU Intellectual Repository
topic Materials Science
Physics and Astronomy
spellingShingle Materials Science
Physics and Astronomy
Kyung Sik Shin
Bibhuti Bhusan Sahu
Manish Kumar
Komgrit Leksakul
Jeon Geon Han
Tailoring of microstructure in hydrogenated nanocrystalline Si thin films by ICP-assisted RF magnetron sputtering
description © 2015 IOP Publishing Ltd. Utilizing plasma-assisted deposition by combining an RF magnetron and an inductively coupled plasma (ICP) source it is possible to fabricate highly crystallized nc-Si:H films at a relatively low substrate temperature (300 °C). Microstructural analysis reveals enhancement in crystallinity along with (2 2 0) preferential orientation throughout the depth of the film. The possible mechanism of crystallinity enhancement and preferential orientation is presented on the basis of plasma diagnostics using optical emission spectroscopy and various film analysis tools. This work also reports the effectiveness of the ICP source and elevated temperature for the control of film microstructure and crystallinity.
format Journal
author Kyung Sik Shin
Bibhuti Bhusan Sahu
Manish Kumar
Komgrit Leksakul
Jeon Geon Han
author_facet Kyung Sik Shin
Bibhuti Bhusan Sahu
Manish Kumar
Komgrit Leksakul
Jeon Geon Han
author_sort Kyung Sik Shin
title Tailoring of microstructure in hydrogenated nanocrystalline Si thin films by ICP-assisted RF magnetron sputtering
title_short Tailoring of microstructure in hydrogenated nanocrystalline Si thin films by ICP-assisted RF magnetron sputtering
title_full Tailoring of microstructure in hydrogenated nanocrystalline Si thin films by ICP-assisted RF magnetron sputtering
title_fullStr Tailoring of microstructure in hydrogenated nanocrystalline Si thin films by ICP-assisted RF magnetron sputtering
title_full_unstemmed Tailoring of microstructure in hydrogenated nanocrystalline Si thin films by ICP-assisted RF magnetron sputtering
title_sort tailoring of microstructure in hydrogenated nanocrystalline si thin films by icp-assisted rf magnetron sputtering
publishDate 2018
url https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84947093700&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/54598
_version_ 1681424350092197888

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