Improved PECVD pre-metal oxide liner deposition process with low residual charge non-uniformity in film to avoid excessive PID
International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings
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2014
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sg-nus-scholar.10635-505672015-01-17T03:47:21Z Improved PECVD pre-metal oxide liner deposition process with low residual charge non-uniformity in film to avoid excessive PID Cha, C.L. Vassiliev, V. Chor, E.F. See, A.K. ELECTRICAL ENGINEERING PHYSICS International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings 38-41 00243 2014-04-23T02:59:53Z 2014-04-23T02:59:53Z 2000 Article Cha, C.L.,Vassiliev, V.,Chor, E.F.,See, A.K. (2000). Improved PECVD pre-metal oxide liner deposition process with low residual charge non-uniformity in film to avoid excessive PID. International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings : 38-41. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/50567 NOT_IN_WOS Scopus |
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| description |
International Symposium on Plasma Process-Induced Damage, P2ID, Proceedings |
| author2 |
ELECTRICAL ENGINEERING |
| author_facet |
ELECTRICAL ENGINEERING Cha, C.L. Vassiliev, V. Chor, E.F. See, A.K. |
| format |
Article |
| author |
Cha, C.L. Vassiliev, V. Chor, E.F. See, A.K. |
| spellingShingle |
Cha, C.L. Vassiliev, V. Chor, E.F. See, A.K. Improved PECVD pre-metal oxide liner deposition process with low residual charge non-uniformity in film to avoid excessive PID |
| author_sort |
Cha, C.L. |
| title |
Improved PECVD pre-metal oxide liner deposition process with low residual charge non-uniformity in film to avoid excessive PID |
| title_short |
Improved PECVD pre-metal oxide liner deposition process with low residual charge non-uniformity in film to avoid excessive PID |
| title_full |
Improved PECVD pre-metal oxide liner deposition process with low residual charge non-uniformity in film to avoid excessive PID |
| title_fullStr |
Improved PECVD pre-metal oxide liner deposition process with low residual charge non-uniformity in film to avoid excessive PID |
| title_full_unstemmed |
Improved PECVD pre-metal oxide liner deposition process with low residual charge non-uniformity in film to avoid excessive PID |
| title_sort |
improved pecvd pre-metal oxide liner deposition process with low residual charge non-uniformity in film to avoid excessive pid |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/50567 |
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1681083692437471232 |