Mask error enhancement factor for sub 0.13μm lithography

Mask error enhancement factor for sub 0.13μm lithography

10.1117/12.435788

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Bibliographic Details
Main Authors: Tan, S.K., Lin, Q., Quan, C., Tay, C.J., See, A.
Other Authors: MECHANICAL ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
DUV scanner
Half-tone PSM
MEEF
NA/PC
Resists
Online Access:http://scholarbank.nus.edu.sg/handle/10635/73584
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/73584

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