Mask error enhancement factor for sub 0.13μm lithography
10.1117/12.435788
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2014
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sg-nus-scholar.10635-735842023-10-26T20:12:34Z Mask error enhancement factor for sub 0.13μm lithography Tan, S.K. Lin, Q. Quan, C. Tay, C.J. See, A. MECHANICAL ENGINEERING PHYSICS DUV scanner Half-tone PSM MEEF NA/PC Resists 10.1117/12.435788 Proceedings of SPIE - The International Society for Optical Engineering 4346 2 879-887 PSISD 2014-06-19T05:36:54Z 2014-06-19T05:36:54Z 2001 Conference Paper Tan, S.K., Lin, Q., Quan, C., Tay, C.J., See, A. (2001). Mask error enhancement factor for sub 0.13μm lithography. Proceedings of SPIE - The International Society for Optical Engineering 4346 (2) : 879-887. ScholarBank@NUS Repository. https://doi.org/10.1117/12.435788 0277786X http://scholarbank.nus.edu.sg/handle/10635/73584 000175014100087 Scopus |
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National University of Singapore |
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NUS Library |
| continent |
Asia |
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Singapore Singapore |
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NUS Library |
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ScholarBank@NUS |
| topic |
DUV scanner Half-tone PSM MEEF NA/PC Resists |
| spellingShingle |
DUV scanner Half-tone PSM MEEF NA/PC Resists Tan, S.K. Lin, Q. Quan, C. Tay, C.J. See, A. Mask error enhancement factor for sub 0.13μm lithography |
| description |
10.1117/12.435788 |
| author2 |
MECHANICAL ENGINEERING |
| author_facet |
MECHANICAL ENGINEERING Tan, S.K. Lin, Q. Quan, C. Tay, C.J. See, A. |
| format |
Conference or Workshop Item |
| author |
Tan, S.K. Lin, Q. Quan, C. Tay, C.J. See, A. |
| author_sort |
Tan, S.K. |
| title |
Mask error enhancement factor for sub 0.13μm lithography |
| title_short |
Mask error enhancement factor for sub 0.13μm lithography |
| title_full |
Mask error enhancement factor for sub 0.13μm lithography |
| title_fullStr |
Mask error enhancement factor for sub 0.13μm lithography |
| title_full_unstemmed |
Mask error enhancement factor for sub 0.13μm lithography |
| title_sort |
mask error enhancement factor for sub 0.13μm lithography |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/73584 |
| _version_ |
1781783318122987520 |