Mask error enhancement factor for sub 0.13μm lithography

• Main Authors: Tan, S.K., Lin, Q., Quan, C., Tay, C.J., See, A.
• Other Authors: MECHANICAL ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Subjects: DUV scanner; Half-tone PSM; MEEF; NA/PC; Resists
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/73584
• Institution: National University of Singapore

10.1117/12.435788