Application of phase shift masking to sub-0.13 micron lithography
The main contribution of this thesis is to investigate the application of PSM, combined with other forms of RET, such as OAI and OPC, to poly gate patterning.
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| Format: | Theses and Dissertations |
| Published: |
2008
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| Online Access: | http://hdl.handle.net/10356/4521 |
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| Institution: | Nanyang Technological University |