Application of phase shift masking to sub-0.13 micron lithography
The main contribution of this thesis is to investigate the application of PSM, combined with other forms of RET, such as OAI and OPC, to poly gate patterning.
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2008
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| Online Access: | http://hdl.handle.net/10356/4521 |
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| Institution: | Nanyang Technological University |
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sg-ntu-dr.10356-45212023-07-04T16:39:08Z Application of phase shift masking to sub-0.13 micron lithography Koo, Chee Kiong. Yuan, Larry X.-C. School of Electrical and Electronic Engineering Tam, Siu Chung DRNTU::Engineering::Electrical and electronic engineering::Microelectronics The main contribution of this thesis is to investigate the application of PSM, combined with other forms of RET, such as OAI and OPC, to poly gate patterning. Master of Engineering 2008-09-17T09:53:09Z 2008-09-17T09:53:09Z 2002 2002 Thesis http://hdl.handle.net/10356/4521 Nanyang Technological University application/pdf |
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Nanyang Technological University |
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NTU Library |
| continent |
Asia |
| country |
Singapore Singapore |
| content_provider |
NTU Library |
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DR-NTU |
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DRNTU::Engineering::Electrical and electronic engineering::Microelectronics |
| spellingShingle |
DRNTU::Engineering::Electrical and electronic engineering::Microelectronics Koo, Chee Kiong. Application of phase shift masking to sub-0.13 micron lithography |
| description |
The main contribution of this thesis is to investigate the application of PSM, combined with other forms of RET, such as OAI and OPC, to poly gate patterning. |
| author2 |
Yuan, Larry X.-C. |
| author_facet |
Yuan, Larry X.-C. Koo, Chee Kiong. |
| format |
Theses and Dissertations |
| author |
Koo, Chee Kiong. |
| author_sort |
Koo, Chee Kiong. |
| title |
Application of phase shift masking to sub-0.13 micron lithography |
| title_short |
Application of phase shift masking to sub-0.13 micron lithography |
| title_full |
Application of phase shift masking to sub-0.13 micron lithography |
| title_fullStr |
Application of phase shift masking to sub-0.13 micron lithography |
| title_full_unstemmed |
Application of phase shift masking to sub-0.13 micron lithography |
| title_sort |
application of phase shift masking to sub-0.13 micron lithography |
| publishDate |
2008 |
| url |
http://hdl.handle.net/10356/4521 |
| _version_ |
1772825929845833728 |