Application of phase shift masking to sub-0.13 micron lithography

• Main Author: Koo, Chee Kiong.
• Other Authors: Yuan, Larry X.-C.
• Format: Theses and Dissertations
• Published: 2008
• Subjects: DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
• Online Access: http://hdl.handle.net/10356/4521
• Institution: Nanyang Technological University

The main contribution of this thesis is to investigate the application of PSM, combined with other forms of RET, such as OAI and OPC, to poly gate patterning.