APA引文

Koo, C. K., & Yuan, L. X. (2008). Application of phase shift masking to sub-0.13 micron lithography.

Chicago Style Citation

Koo, Chee Kiong., and Larry X.-C Yuan. Application of Phase Shift Masking to Sub-0.13 Micron Lithography. 2008.

MLA引文

Koo, Chee Kiong., and Larry X.-C Yuan. Application of Phase Shift Masking to Sub-0.13 Micron Lithography. 2008.

警告：這些引文格式不一定是100％准確.