Koo, C. K., & Yuan, L. X. (2008). Application of phase shift masking to sub-0.13 micron lithography.
Chicago Style CitationKoo, Chee Kiong., and Larry X.-C Yuan. Application of Phase Shift Masking to Sub-0.13 Micron Lithography. 2008.
MLA CitationKoo, Chee Kiong., and Larry X.-C Yuan. Application of Phase Shift Masking to Sub-0.13 Micron Lithography. 2008.
Warning: These citations may not always be 100% accurate.