Mask error enhancement factor for sub 0.13μm lithography

Mask error enhancement factor for sub 0.13μm lithography

10.1117/12.435788

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書目詳細資料
Main Authors:	Tan, S.K., Lin, Q., Quan, C., Tay, C.J., See, A.
其他作者:	PHYSICS
格式:	Conference or Workshop Item
出版:	2014
主題:	DUV scanner Half-tone PSM MEEF NA/PC Resists
在線閱讀:	http://scholarbank.nus.edu.sg/handle/10635/73584
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!
機構:	National University of Singapore

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