MEF studies for attenuated phase shift mask for sub 0.13 um technology using 248 nm

MEF studies for attenuated phase shift mask for sub 0.13 um technology using 248 nm

10.1117/12.474520

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Bibliographic Details
Main Authors: Tan, S.K., Lin, Q., Chua, G.S., Quan, C., Tay, C.J.
Other Authors: MECHANICAL ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
0.10 um
248 nm
Assist features
MEF
Phase-shift mask
Online Access:http://scholarbank.nus.edu.sg/handle/10635/73599
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/73599

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