MEF studies for attenuated phase shift mask for sub 0.13 um technology using 248 nm
10.1117/12.474520
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| Main Authors: | , , , , |
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| Other Authors: | |
| Format: | Conference or Workshop Item |
| Published: |
2014
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| Subjects: | |
| Online Access: | http://scholarbank.nus.edu.sg/handle/10635/73599 |
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| Institution: | National University of Singapore |