MEF studies for attenuated phase shift mask for sub 0.13 um technology using 248 nm

MEF studies for attenuated phase shift mask for sub 0.13 um technology using 248 nm

10.1117/12.474520

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Bibliographic Details
Main Authors: Tan, S.K., Lin, Q., Chua, G.S., Quan, C., Tay, C.J.
Other Authors: MECHANICAL ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
0.10 um
248 nm
Assist features
MEF
Phase-shift mask
Online Access:http://scholarbank.nus.edu.sg/handle/10635/73599
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-735992023-10-26T20:12:23Z MEF studies for attenuated phase shift mask for sub 0.13 um technology using 248 nm Tan, S.K. Lin, Q. Chua, G.S. Quan, C. Tay, C.J. MECHANICAL ENGINEERING 0.10 um 248 nm Assist features MEF Phase-shift mask 10.1117/12.474520 Proceedings of SPIE - The International Society for Optical Engineering 4691 II 1366-1372 PSISD 2014-06-19T05:37:05Z 2014-06-19T05:37:05Z 2002 Conference Paper Tan, S.K., Lin, Q., Chua, G.S., Quan, C., Tay, C.J. (2002). MEF studies for attenuated phase shift mask for sub 0.13 um technology using 248 nm. Proceedings of SPIE - The International Society for Optical Engineering 4691 II : 1366-1372. ScholarBank@NUS Repository. https://doi.org/10.1117/12.474520 0277786X http://scholarbank.nus.edu.sg/handle/10635/73599 000178104200134 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic 0.10 um
248 nm
Assist features
MEF
Phase-shift mask
spellingShingle 0.10 um
248 nm
Assist features
MEF
Phase-shift mask
Tan, S.K.
Lin, Q.
Chua, G.S.
Quan, C.
Tay, C.J.
MEF studies for attenuated phase shift mask for sub 0.13 um technology using 248 nm
description 10.1117/12.474520
author2 MECHANICAL ENGINEERING
author_facet MECHANICAL ENGINEERING
Tan, S.K.
Lin, Q.
Chua, G.S.
Quan, C.
Tay, C.J.
format Conference or Workshop Item
author Tan, S.K.
Lin, Q.
Chua, G.S.
Quan, C.
Tay, C.J.
author_sort Tan, S.K.
title MEF studies for attenuated phase shift mask for sub 0.13 um technology using 248 nm
title_short MEF studies for attenuated phase shift mask for sub 0.13 um technology using 248 nm
title_full MEF studies for attenuated phase shift mask for sub 0.13 um technology using 248 nm
title_fullStr MEF studies for attenuated phase shift mask for sub 0.13 um technology using 248 nm
title_full_unstemmed MEF studies for attenuated phase shift mask for sub 0.13 um technology using 248 nm
title_sort mef studies for attenuated phase shift mask for sub 0.13 um technology using 248 nm
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/73599
_version_ 1781783319432658944

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