Sub-0.10 μm Lithography technology with resolution enhancement technique

Sub-0.10 μm Lithography technology with resolution enhancement technique

10.1117/12.474544

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Bibliographic Details
Main Authors: Chua, G.S., Lin, Q., Tay, C.J., Quan, C.
Other Authors: MECHANICAL ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Assist features
Depth of focus
Optical proximity correction
Resolution enhancement technique
Scattering bars
Online Access:http://scholarbank.nus.edu.sg/handle/10635/73892
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Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/73892

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