Sub-0.10 μm Lithography technology with resolution enhancement technique

Sub-0.10 μm Lithography technology with resolution enhancement technique

10.1117/12.474544

Saved in:
Bibliographic Details
Main Authors: Chua, G.S., Lin, Q., Tay, C.J., Quan, C.
Other Authors: MECHANICAL ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Assist features
Depth of focus
Optical proximity correction
Resolution enhancement technique
Scattering bars
Online Access:http://scholarbank.nus.edu.sg/handle/10635/73892
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
Description
Summary:10.1117/12.474544

Similar Items