Performance improvement in gate level lithography using resolution enhancement techniques

Performance improvement in gate level lithography using resolution enhancement techniques

10.1016/j.mee.2004.04.001

Saved in:
Bibliographic Details
Main Authors: Chua, G.S., Tay, C.J., Quan, C., Lin, Q.
Other Authors: MECHANICAL ENGINEERING
Format: Article
Published: 2014
Subjects:
Assist features
Depth of focus
Optical proximity correction
Resolution enhancement technique
Scattering bars
Online Access:http://scholarbank.nus.edu.sg/handle/10635/61070
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore

Internet

http://scholarbank.nus.edu.sg/handle/10635/61070

Similar Items