Performance improvement in gate level lithography using resolution enhancement techniques
10.1016/j.mee.2004.04.001
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sg-nus-scholar.10635-610702023-10-26T07:44:33Z Performance improvement in gate level lithography using resolution enhancement techniques Chua, G.S. Tay, C.J. Quan, C. Lin, Q. MECHANICAL ENGINEERING Assist features Depth of focus Optical proximity correction Resolution enhancement technique Scattering bars 10.1016/j.mee.2004.04.001 Microelectronic Engineering 75 2 155-164 MIENE 2014-06-17T06:30:40Z 2014-06-17T06:30:40Z 2004-08 Article Chua, G.S., Tay, C.J., Quan, C., Lin, Q. (2004-08). Performance improvement in gate level lithography using resolution enhancement techniques. Microelectronic Engineering 75 (2) : 155-164. ScholarBank@NUS Repository. https://doi.org/10.1016/j.mee.2004.04.001 01679317 http://scholarbank.nus.edu.sg/handle/10635/61070 000223442000005 Scopus |
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Assist features Depth of focus Optical proximity correction Resolution enhancement technique Scattering bars |
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Assist features Depth of focus Optical proximity correction Resolution enhancement technique Scattering bars Chua, G.S. Tay, C.J. Quan, C. Lin, Q. Performance improvement in gate level lithography using resolution enhancement techniques |
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10.1016/j.mee.2004.04.001 |
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MECHANICAL ENGINEERING |
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MECHANICAL ENGINEERING Chua, G.S. Tay, C.J. Quan, C. Lin, Q. |
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Chua, G.S. Tay, C.J. Quan, C. Lin, Q. |
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Chua, G.S. |
title |
Performance improvement in gate level lithography using resolution enhancement techniques |
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Performance improvement in gate level lithography using resolution enhancement techniques |
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Performance improvement in gate level lithography using resolution enhancement techniques |
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Performance improvement in gate level lithography using resolution enhancement techniques |
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Performance improvement in gate level lithography using resolution enhancement techniques |
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performance improvement in gate level lithography using resolution enhancement techniques |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/61070 |
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