Morphology and crystallization kinetics in HfO2 thin films grown by atomic layer deposition

• Main Authors: Ho, M.-Y., Gong, H., Wilk, G.D., Busch, B.W., Green, M.L., Voyles, P.M., Muller, D.A., Bude, M., Lin, W.H., See, A., Loomans, M.E., Lahiri, S.K., Räisänen, P.I.
• Other Authors: MATERIALS SCIENCE
• Format: Article
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/107131
• Institution: National University of Singapore

10.1063/1.1534381