MIM capacitors with HfO2 and HfAlOx for Si RF and analog applications

MIM capacitors with HfO2 and HfAlOx for Si RF and analog applications

Materials Research Society Symposium - Proceedings

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Bibliographic Details
Main Authors: Yu, X., Zhu, C., Hu, H., Chin, A., Li, M.F., Cho, B.J., Kwong, D.-L., Foo, P.D., Yu, M.B.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/83953
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/83953

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