TDDB characteristics of ultra-thin HfN/HfO2 gate stack

• Main Authors: Yang, H., Sa, N., Tang, L., Liu, X., Kang, J., Han, R., Yu, H.Y., Ren, C., Li, M.-F., Chan, D.S.H., Kwong, D.-L.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/84272
• Institution: National University of Singapore

International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT