TDDB characteristics of ultra-thin HfN/HfO2 gate stack

TDDB characteristics of ultra-thin HfN/HfO2 gate stack

International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT

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Main Authors: Yang, H., Sa, N., Tang, L., Liu, X., Kang, J., Han, R., Yu, H.Y., Ren, C., Li, M.-F., Chan, D.S.H., Kwong, D.-L.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/84272
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Institution: National University of Singapore
id sg-nus-scholar.10635-84272
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spelling sg-nus-scholar.10635-842722015-01-08T02:57:24Z TDDB characteristics of ultra-thin HfN/HfO2 gate stack Yang, H. Sa, N. Tang, L. Liu, X. Kang, J. Han, R. Yu, H.Y. Ren, C. Li, M.-F. Chan, D.S.H. Kwong, D.-L. ELECTRICAL & COMPUTER ENGINEERING International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT 2 808-811 2014-10-07T04:50:47Z 2014-10-07T04:50:47Z 2004 Conference Paper Yang, H.,Sa, N.,Tang, L.,Liu, X.,Kang, J.,Han, R.,Yu, H.Y.,Ren, C.,Li, M.-F.,Chan, D.S.H.,Kwong, D.-L. (2004). TDDB characteristics of ultra-thin HfN/HfO2 gate stack. International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT 2 : 808-811. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/84272 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Yang, H.
Sa, N.
Tang, L.
Liu, X.
Kang, J.
Han, R.
Yu, H.Y.
Ren, C.
Li, M.-F.
Chan, D.S.H.
Kwong, D.-L.
format Conference or Workshop Item
author Yang, H.
Sa, N.
Tang, L.
Liu, X.
Kang, J.
Han, R.
Yu, H.Y.
Ren, C.
Li, M.-F.
Chan, D.S.H.
Kwong, D.-L.
spellingShingle Yang, H.
Sa, N.
Tang, L.
Liu, X.
Kang, J.
Han, R.
Yu, H.Y.
Ren, C.
Li, M.-F.
Chan, D.S.H.
Kwong, D.-L.
TDDB characteristics of ultra-thin HfN/HfO2 gate stack
author_sort Yang, H.
title TDDB characteristics of ultra-thin HfN/HfO2 gate stack
title_short TDDB characteristics of ultra-thin HfN/HfO2 gate stack
title_full TDDB characteristics of ultra-thin HfN/HfO2 gate stack
title_fullStr TDDB characteristics of ultra-thin HfN/HfO2 gate stack
title_full_unstemmed TDDB characteristics of ultra-thin HfN/HfO2 gate stack
title_sort tddb characteristics of ultra-thin hfn/hfo2 gate stack
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/84272
_version_ 1681089588104265728

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