Atomic layer deposition of palladium thin film from palladium (II) hexafluoroacetylacetonate and ozone reactant

• Main Authors: Zou, Yiming, Li, Jiahui, Cheng, Chunyu, Wang, Zhiwei, Ong, Amanda Jiamin, Goei, Ronn, Li, Xianglin, Li, Shuzhou, Tok, Alfred Iing Yoong
• 其他作者: School of Materials Science and Engineering
• 格式: Article
• 語言: English
• 出版: 2022
• 主題: Engineering::Materials; Palladium; Atomic Layer Deposition
• 在線閱讀: https://hdl.handle.net/10356/159583
• 機構: Nanyang Technological University

Palladium thin films have been grown by thermal atomic layer (ALD) process using Palladium (II) hexafluoroacetylacetonate (Pd(hfac)2) and O3 as the precursors without molecular hydrogen or formalin in a temperature range of 180–220 °C. The palladium films were deposited on sapphire (α-Al2O3, (0001))...