Hot-wire chemical vapor deposition low-loss hydrogenated amorphous silicon waveguides for silicon photonic devices

• المؤلفون الرئيسيون: Oo, Swe Z., Tarazona, Antulio, Khokhar, Ali Z., Petra, Rafidah, Franz, Yohann, Mashanovich, Goran Z., Reed, Graham T., Peacock, Anna C., Chong, Harold M. H.
• مؤلفون آخرون: School of Electrical and Electronic Engineering
• التنسيق: مقال
• اللغة: English
• منشور في: 2021
• الموضوعات: Engineering::Electrical and electronic engineering; Microcrystalline Silicon; Films
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/148729

We demonstrate low-loss hydrogenated amorphous silicon (a-Si:H) waveguides by hot-wire chemical vapor deposition (HWCVD). The effect of hydrogenation in a-Si at different deposition temperatures has been investigated and analyzed by Raman spectroscopy. We obtained an optical quality a-Si:H waveguide...