Study of the leakage behavior of PZT thin film

This Final Year Project discusses primarily about the ferroelectric material lead zirconate titanate. Its unique spontaneous polarization and dielectric properties make it usual for modern storage devices such as NvFRAM and SWNT FET. The project investigates leakage current of the PZT thin film, and...

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Bibliographic Details
Main Author: Hoon, Xiao Ping.
Other Authors: Wang Junling
Format: Final Year Project
Language:English
Published: 2009
Subjects:
Online Access:http://hdl.handle.net/10356/15140
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Institution: Nanyang Technological University
Language: English
Description
Summary:This Final Year Project discusses primarily about the ferroelectric material lead zirconate titanate. Its unique spontaneous polarization and dielectric properties make it usual for modern storage devices such as NvFRAM and SWNT FET. The project investigates leakage current of the PZT thin film, and fits the results to one or more of the leakage current mechanisms for an insulator. Thereafter, by applying a bias for an elongated time at a fixed high temperature, the shift of point defects (oxygen vacancies) in the film is studied through electrode-PZT interface barrier height measurements. The results are correlated with hysteresis loop shifts before and after the applied bias.