Lingaparthi, R., Dharmarasu, N., Radhakrishnan, K., Zheng, Y., & Engineering, S. o. E. a. E. (2022). Effects of Si doping well beyond the Mott transition limit in GaN epilayers grown by plasma-assisted molecular beam epitaxy.
Chicago Style CitationLingaparthi, R., Nethaji Dharmarasu, K. Radhakrishnan, Y. Zheng, and School of Electrical and Electronic Engineering. Effects of Si Doping Well Beyond the Mott Transition Limit in GaN Epilayers Grown By Plasma-assisted Molecular Beam Epitaxy. 2022.
MLA引文Lingaparthi, R., et al. Effects of Si Doping Well Beyond the Mott Transition Limit in GaN Epilayers Grown By Plasma-assisted Molecular Beam Epitaxy. 2022.
警告:這些引文格式不一定是100%准確.