Nanosphere lithography for ordered-arrayed semiconductor nanowire formation via top-down method

• Main Author: Low, Guorong.
• Other Authors: Pey Kin Leong
• Format: Final Year Project
• Language: English
• Published: 2009
• Subjects: DRNTU::Engineering::Electrical and electronic engineering::Nanoelectronics
• Online Access: http://hdl.handle.net/10356/16757
• Institution: Nanyang Technological University

Vertically aligned group IV semiconductor nanowires are great interest of research recently because of their promising applications in future large–density electronics and photonics and their compatibility with current Si dominated technology. In this project, nanosphere lithography will be explo...