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Broad-energy oxygen ion implantation controlled magnetization dynamics in CoFeTaZr

In this paper, a novel pulsed broad energy spectrum ion-implantation technique, using the dense plasma focus device (DPF), for uniform oxygen-ion doping along the thickness of a ~250 nm thick magnetic CoFeTaZr layer is investigated. A new operational regime of the dense plasma focus – the off-focus...

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Main Authors: Vas, Joseph Vimal, Medwal, Rohit, Chaudhuri, Ushnish, Mishra, Mayank, Chaurasiya, Avinash, Mahendiran, Ramanathan, Piramanayagam, S. N., Rawat, Rajdeep Singh, Lee, Paul Choon Keat
其他作者: School of Physical and Mathematical Sciences
格式: Article
語言:English
出版: 2023
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在線閱讀:https://hdl.handle.net/10356/167879
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機構: Nanyang Technological University
語言: English