Carrier localization on the nanometer-scale limits transport in metal oxide photoabsorbers

Metal oxides are considered as stable and low-cost photoelectrode candidates for hydrogen production by photoelectrochemical solar water splitting. However, their power conversion efficiencies usually suffer from poor transport of photogenerated charge carriers, which has been attributed previously...

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Main Authors: Schleuning, Markus, Kölbach, Moritz, Ahmet, Ibbi, Präg, Raphael, Gottesman, Ronen, Gunder, Rene, Zhang, Mengyuan, Wargulski, Dan Ralf, Abou-Ras, Daniel, Grave, Daniel A., Abdi, Fatwa F., van de Krol, Roel, Schwarzburg, Klaus, Eichberger, Rainer, Friedrich, Dennis, Hempel, Hannes
Other Authors: School of Materials Science and Engineering
Format: Article
Language:English
Published: 2023
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Online Access:https://hdl.handle.net/10356/170645
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spelling sg-ntu-dr.10356-1706452023-09-29T15:45:00Z Carrier localization on the nanometer-scale limits transport in metal oxide photoabsorbers Schleuning, Markus Kölbach, Moritz Ahmet, Ibbi Präg, Raphael Gottesman, Ronen Gunder, Rene Zhang, Mengyuan Wargulski, Dan Ralf Abou-Ras, Daniel Grave, Daniel A. Abdi, Fatwa F. van de Krol, Roel Schwarzburg, Klaus Eichberger, Rainer Friedrich, Dennis Hempel, Hannes School of Materials Science and Engineering Engineering::Materials Carrier Localization Metal Oxides Metal oxides are considered as stable and low-cost photoelectrode candidates for hydrogen production by photoelectrochemical solar water splitting. However, their power conversion efficiencies usually suffer from poor transport of photogenerated charge carriers, which has been attributed previously to a variety of effects occurring on different time and length scales. In search for common understanding and for a better photo-conducting metal oxide photoabsorber, CuFeO2, α-SnWO4, BaSnO3, FeVO4, CuBi2O4, α-Fe2O3, and BiVO4 are compared. Their kinetics of thermalization, trapping, localization, and recombination are monitored continuously 100 fs–100 µs and mobilities are determined for different probing lengths by combined time-resolved terahertz and microwave spectroscopy. As common issue, we find small mobilities < 3 cm2V-1s-1. Partial carrier localization further slows carrier diffusion beyond localization lengths of 1–6 nm and explains the extraordinarily long conductivity tails, which should not be taken as a sign of long diffusion lengths. For CuFeO2, the localization is attributed to electrostatic barriers that enclose the crystallographic domains. The most promising novel material is BaSnO3, which exhibits the highest mobility after reducing carrier localization by annealing in H2. Such overcoming of carrier localization should be an objective of future efforts to enhance charge transport in metal oxides. Published version The authors acknowledge the financial support for this work from the Helmholtz International Research School "Hybrid Integrated Systems for Conversion of Solar Energy" (HI-SCORE), an initiative co-funded by the Initiative and Networking Fund of the Helmholtz Association (HIRS-0008). M.K. acknowledges funding from the German Bundesministerium fuer Bildung and Forschung (BMBF), project "H2Demo" (no. 03SF0619K). We acknowledge Avner Rothschild for providing lab facilities at the Technion. Open access funding enabled and organized by Projekt DEAL. 2023-09-25T03:29:37Z 2023-09-25T03:29:37Z 2023 Journal Article Schleuning, M., Kölbach, M., Ahmet, I., Präg, R., Gottesman, R., Gunder, R., Zhang, M., Wargulski, D. R., Abou-Ras, D., Grave, D. A., Abdi, F. F., van de Krol, R., Schwarzburg, K., Eichberger, R., Friedrich, D. & Hempel, H. (2023). Carrier localization on the nanometer-scale limits transport in metal oxide photoabsorbers. Advanced Functional Materials, 33(25), 2300065-. https://dx.doi.org/10.1002/adfm.202300065 1616-301X https://hdl.handle.net/10356/170645 10.1002/adfm.202300065 2-s2.0-85150984093 25 33 2300065 en Advanced Functional Materials © 2023 The Authors. Advanced Functional Materials published by Wiley-VCH GmbH. This is an open access article under the terms of the Creative Commons Attribution License, which permits use, distribution and reproduction in any medium, provided the original work is properly cited. application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
language English
topic Engineering::Materials
Carrier Localization
Metal Oxides
spellingShingle Engineering::Materials
Carrier Localization
Metal Oxides
Schleuning, Markus
Kölbach, Moritz
Ahmet, Ibbi
Präg, Raphael
Gottesman, Ronen
Gunder, Rene
Zhang, Mengyuan
Wargulski, Dan Ralf
Abou-Ras, Daniel
Grave, Daniel A.
Abdi, Fatwa F.
van de Krol, Roel
Schwarzburg, Klaus
Eichberger, Rainer
Friedrich, Dennis
Hempel, Hannes
Carrier localization on the nanometer-scale limits transport in metal oxide photoabsorbers
description Metal oxides are considered as stable and low-cost photoelectrode candidates for hydrogen production by photoelectrochemical solar water splitting. However, their power conversion efficiencies usually suffer from poor transport of photogenerated charge carriers, which has been attributed previously to a variety of effects occurring on different time and length scales. In search for common understanding and for a better photo-conducting metal oxide photoabsorber, CuFeO2, α-SnWO4, BaSnO3, FeVO4, CuBi2O4, α-Fe2O3, and BiVO4 are compared. Their kinetics of thermalization, trapping, localization, and recombination are monitored continuously 100 fs–100 µs and mobilities are determined for different probing lengths by combined time-resolved terahertz and microwave spectroscopy. As common issue, we find small mobilities < 3 cm2V-1s-1. Partial carrier localization further slows carrier diffusion beyond localization lengths of 1–6 nm and explains the extraordinarily long conductivity tails, which should not be taken as a sign of long diffusion lengths. For CuFeO2, the localization is attributed to electrostatic barriers that enclose the crystallographic domains. The most promising novel material is BaSnO3, which exhibits the highest mobility after reducing carrier localization by annealing in H2. Such overcoming of carrier localization should be an objective of future efforts to enhance charge transport in metal oxides.
author2 School of Materials Science and Engineering
author_facet School of Materials Science and Engineering
Schleuning, Markus
Kölbach, Moritz
Ahmet, Ibbi
Präg, Raphael
Gottesman, Ronen
Gunder, Rene
Zhang, Mengyuan
Wargulski, Dan Ralf
Abou-Ras, Daniel
Grave, Daniel A.
Abdi, Fatwa F.
van de Krol, Roel
Schwarzburg, Klaus
Eichberger, Rainer
Friedrich, Dennis
Hempel, Hannes
format Article
author Schleuning, Markus
Kölbach, Moritz
Ahmet, Ibbi
Präg, Raphael
Gottesman, Ronen
Gunder, Rene
Zhang, Mengyuan
Wargulski, Dan Ralf
Abou-Ras, Daniel
Grave, Daniel A.
Abdi, Fatwa F.
van de Krol, Roel
Schwarzburg, Klaus
Eichberger, Rainer
Friedrich, Dennis
Hempel, Hannes
author_sort Schleuning, Markus
title Carrier localization on the nanometer-scale limits transport in metal oxide photoabsorbers
title_short Carrier localization on the nanometer-scale limits transport in metal oxide photoabsorbers
title_full Carrier localization on the nanometer-scale limits transport in metal oxide photoabsorbers
title_fullStr Carrier localization on the nanometer-scale limits transport in metal oxide photoabsorbers
title_full_unstemmed Carrier localization on the nanometer-scale limits transport in metal oxide photoabsorbers
title_sort carrier localization on the nanometer-scale limits transport in metal oxide photoabsorbers
publishDate 2023
url https://hdl.handle.net/10356/170645
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