Symmetry breaking for semiconductor photocatalysis

Numerous strategies have been developed to tailor the photocatalytic performance of catalysts. However, do any general commonalities exist in these strategies for activity improvement? It is desirable to explore the general regularity of these strategies, thus guiding further developments in the fie...

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Main Authors: Di, Jun, Jiang, Wei, Liu, Zheng
Other Authors: School of Materials Science and Engineering
Format: Article
Language:English
Published: 2024
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Online Access:https://hdl.handle.net/10356/173402
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Institution: Nanyang Technological University
Language: English
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spelling sg-ntu-dr.10356-1734022024-02-06T07:06:07Z Symmetry breaking for semiconductor photocatalysis Di, Jun Jiang, Wei Liu, Zheng School of Materials Science and Engineering Chemistry Engineering Photocatalysis Symmetry Breaking Numerous strategies have been developed to tailor the photocatalytic performance of catalysts. However, do any general commonalities exist in these strategies for activity improvement? It is desirable to explore the general regularity of these strategies, thus guiding further developments in the field of photocatalysis. In this review, we propose that the key or essential nature of improved photocatalytic activity depends considerably on the symmetry breaking of the materials. The detailed contributions of symmetry breaking to the increased photocatalytic activity are intensely discussed and summarized based on the location of symmetry breaking; namely, spontaneous symmetry breaking in the material interior, localized symmetry breaking on the material surface, and external-field-induced symmetry breaking beyond the material. Ministry of Education (MOE) Submitted/Accepted version This work was supported by Singapore Ministry of Education AcRF Tier 2 (MOE2019-T2-2-105), AcRF Tier 1 RG4/17, RG161/19, Fundamental Research Funds for the Central Universities (Project 30922010302), and Start-Up Grant from Nanjing University of Science and Technology (Project AE89991/397). 2024-02-02T08:08:08Z 2024-02-02T08:08:08Z 2022 Journal Article Di, J., Jiang, W. & Liu, Z. (2022). Symmetry breaking for semiconductor photocatalysis. Trends in Chemistry, 4(11), 1045-1055. https://dx.doi.org/10.1016/j.trechm.2022.08.010 2589-5974 https://hdl.handle.net/10356/173402 10.1016/j.trechm.2022.08.010 2-s2.0-85138595707 11 4 1045 1055 en MOE2019-T2-2-105 RG4/17 RG161/19 Trends in Chemistry © 2022 Elsevier Inc. All rights reserved. This article may be downloaded for personal use only. Any other use requires prior permission of the copyright holder. The Version of Record is available online at http://doi.org/10.1016/j.trechm.2022.08.010. application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
language English
topic Chemistry
Engineering
Photocatalysis
Symmetry Breaking
spellingShingle Chemistry
Engineering
Photocatalysis
Symmetry Breaking
Di, Jun
Jiang, Wei
Liu, Zheng
Symmetry breaking for semiconductor photocatalysis
description Numerous strategies have been developed to tailor the photocatalytic performance of catalysts. However, do any general commonalities exist in these strategies for activity improvement? It is desirable to explore the general regularity of these strategies, thus guiding further developments in the field of photocatalysis. In this review, we propose that the key or essential nature of improved photocatalytic activity depends considerably on the symmetry breaking of the materials. The detailed contributions of symmetry breaking to the increased photocatalytic activity are intensely discussed and summarized based on the location of symmetry breaking; namely, spontaneous symmetry breaking in the material interior, localized symmetry breaking on the material surface, and external-field-induced symmetry breaking beyond the material.
author2 School of Materials Science and Engineering
author_facet School of Materials Science and Engineering
Di, Jun
Jiang, Wei
Liu, Zheng
format Article
author Di, Jun
Jiang, Wei
Liu, Zheng
author_sort Di, Jun
title Symmetry breaking for semiconductor photocatalysis
title_short Symmetry breaking for semiconductor photocatalysis
title_full Symmetry breaking for semiconductor photocatalysis
title_fullStr Symmetry breaking for semiconductor photocatalysis
title_full_unstemmed Symmetry breaking for semiconductor photocatalysis
title_sort symmetry breaking for semiconductor photocatalysis
publishDate 2024
url https://hdl.handle.net/10356/173402
_version_ 1794549457774182400