Highly absorbing monolayer MoS2 for a large reflection phase modulation
Manipulation of wavefront lies at the core of next-generation information technologies. Compared to metal and dielectric metasurfaces, atomic 2D materials exhibit excellent prospects toward fulfilling ultra-thin thickness requirements in flat optics in wavefront shaping, with thickness much smaller...
Saved in:
Main Authors: | , , , , , , , , , , |
---|---|
Other Authors: | |
Format: | Article |
Language: | English |
Published: |
2024
|
Subjects: | |
Online Access: | https://hdl.handle.net/10356/180843 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | Nanyang Technological University |
Language: | English |
id |
sg-ntu-dr.10356-180843 |
---|---|
record_format |
dspace |
spelling |
sg-ntu-dr.10356-1808432024-10-29T06:24:25Z Highly absorbing monolayer MoS2 for a large reflection phase modulation Wang, Yingying Li, Zhonglin Li, Xianglin Gao, Kangyu Yin, Zhixiong Liu, Wenjun Zhong, Bo Kan, Guangfeng Wang, Xiaofei Jiang, Jie Shen, Zexiang School of Physical and Mathematical Sciences Physics One port single-mode resonator Phase modulation Manipulation of wavefront lies at the core of next-generation information technologies. Compared to metal and dielectric metasurfaces, atomic 2D materials exhibit excellent prospects toward fulfilling ultra-thin thickness requirements in flat optics in wavefront shaping, with thickness much smaller than those of traditional bulky devices. However, phase manipulation by light propagating through atomic 2D materials is suppressed due to its sub-nanometer thickness. Here, an approach is reported to realize reflection phase singularities by establishing a zero-reflection point in a monolayer MoS2-based multilayer system, which broadens topological study beyond polarization singularity. This is achieved through the creation of a multilayer Fabry-Perot-type interference, and a pronounced phase change in the reflected light is realized due to the high absorption of monolayer MoS2 in the studied wavelength range. As an application, a rapid, sensitive, and label-free detection of SARS-CoV-2 (2019-nCov) antigen is demonstrated with a detection limit of 10−12 M L−1 (62 pg ml−1) by using monolayer MoS2 based optical biosensor. In addition to offering a comprehensive study in phase singularity, efficient wavefront engineering based on the reflective system using materials is presented with atomic thickness which may greatly simplify optical architecture in flat optics, and promote its development toward compactness and integrated functions. This work was supported by the Shandong Provincial Natural Science Foundation (ZR2020MF122), the National Natural Science Foundation of China (51872058), Supporting Program for Innovation Team of Outstanding Youth in Colleges and Universities of Shandong Province (2020KJA005), the scientific research and innovation fund project of Weihai (2019KYCXJJYB17), the Research Foundation of Education Bureau of Hunan Province, China(Grant No. 18B477), and Dongguan Songshan Lake Introduction Program of Leading Innovative and Entrepreneurial Talents. 2024-10-29T06:24:25Z 2024-10-29T06:24:25Z 2024 Journal Article Wang, Y., Li, Z., Li, X., Gao, K., Yin, Z., Liu, W., Zhong, B., Kan, G., Wang, X., Jiang, J. & Shen, Z. (2024). Highly absorbing monolayer MoS2 for a large reflection phase modulation. Advanced Optical Materials, 12(25), 2400429-. https://dx.doi.org/10.1002/adom.202400429 2195-1071 https://hdl.handle.net/10356/180843 10.1002/adom.202400429 2-s2.0-85199041068 25 12 2400429 en Advanced Optical Materials © 2024 Wiley-VCH GmbH. All rights reserved. |
institution |
Nanyang Technological University |
building |
NTU Library |
continent |
Asia |
country |
Singapore Singapore |
content_provider |
NTU Library |
collection |
DR-NTU |
language |
English |
topic |
Physics One port single-mode resonator Phase modulation |
spellingShingle |
Physics One port single-mode resonator Phase modulation Wang, Yingying Li, Zhonglin Li, Xianglin Gao, Kangyu Yin, Zhixiong Liu, Wenjun Zhong, Bo Kan, Guangfeng Wang, Xiaofei Jiang, Jie Shen, Zexiang Highly absorbing monolayer MoS2 for a large reflection phase modulation |
description |
Manipulation of wavefront lies at the core of next-generation information technologies. Compared to metal and dielectric metasurfaces, atomic 2D materials exhibit excellent prospects toward fulfilling ultra-thin thickness requirements in flat optics in wavefront shaping, with thickness much smaller than those of traditional bulky devices. However, phase manipulation by light propagating through atomic 2D materials is suppressed due to its sub-nanometer thickness. Here, an approach is reported to realize reflection phase singularities by establishing a zero-reflection point in a monolayer MoS2-based multilayer system, which broadens topological study beyond polarization singularity. This is achieved through the creation of a multilayer Fabry-Perot-type interference, and a pronounced phase change in the reflected light is realized due to the high absorption of monolayer MoS2 in the studied wavelength range. As an application, a rapid, sensitive, and label-free detection of SARS-CoV-2 (2019-nCov) antigen is demonstrated with a detection limit of 10−12 M L−1 (62 pg ml−1) by using monolayer MoS2 based optical biosensor. In addition to offering a comprehensive study in phase singularity, efficient wavefront engineering based on the reflective system using materials is presented with atomic thickness which may greatly simplify optical architecture in flat optics, and promote its development toward compactness and integrated functions. |
author2 |
School of Physical and Mathematical Sciences |
author_facet |
School of Physical and Mathematical Sciences Wang, Yingying Li, Zhonglin Li, Xianglin Gao, Kangyu Yin, Zhixiong Liu, Wenjun Zhong, Bo Kan, Guangfeng Wang, Xiaofei Jiang, Jie Shen, Zexiang |
format |
Article |
author |
Wang, Yingying Li, Zhonglin Li, Xianglin Gao, Kangyu Yin, Zhixiong Liu, Wenjun Zhong, Bo Kan, Guangfeng Wang, Xiaofei Jiang, Jie Shen, Zexiang |
author_sort |
Wang, Yingying |
title |
Highly absorbing monolayer MoS2 for a large reflection phase modulation |
title_short |
Highly absorbing monolayer MoS2 for a large reflection phase modulation |
title_full |
Highly absorbing monolayer MoS2 for a large reflection phase modulation |
title_fullStr |
Highly absorbing monolayer MoS2 for a large reflection phase modulation |
title_full_unstemmed |
Highly absorbing monolayer MoS2 for a large reflection phase modulation |
title_sort |
highly absorbing monolayer mos2 for a large reflection phase modulation |
publishDate |
2024 |
url |
https://hdl.handle.net/10356/180843 |
_version_ |
1814777764790665216 |