Electrophoretic deposition of advanced ceramics
Electrophoretic Deposition (EPD) has received great attention in the recent decade due to its short processing time and simple set up which allow the forming of both thick and thin ceramic films economically. The ceramic film produced can be applied in many areas, for example, in electronic devices...
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| Format: | Theses and Dissertations |
| Language: | English |
| Published: |
2009
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| Online Access: | http://hdl.handle.net/10356/19335 |
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| Institution: | Nanyang Technological University |
| Language: | English |
| Summary: | Electrophoretic Deposition (EPD) has received great attention in the recent decade due to its short processing time and simple set up which allow the forming of both thick and thin ceramic films economically. The ceramic film produced can be applied in many areas, for example, in electronic devices such as micro-electric-mechanical-systems (MEMS), high performance capacitors, solid oxide duel cells and functionally gradient materials (FGM). Compared to the conventional techniques such as chemical vapour deposition, sol-gel deposition and sputtering. EPD technique is also a cheaper method for mass production. In addition, it is conformable to various shapes for different applications. |
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