Contact-displacement PD deposition for electroless copper application

Electroless (EL) Cu, a potential seed layer material for Cu interconnects used in nanoelectronics, is intimately dependent on the surface activation of catalytic Pd particles. A comprehensive understanding on the deposition mechanism of Pd particles is thus critically important. In this thesis, the...

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Bibliographic Details
Main Author: Lau, Ping Ping
Other Authors: Wong Chee Cheong
Format: Theses and Dissertations
Language:English
Published: 2009
Subjects:
Online Access:https://hdl.handle.net/10356/20632
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Institution: Nanyang Technological University
Language: English
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