Prediction of temperature offsets in the epitaxy process
92 p.
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2010
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sg-ntu-dr.10356-360462023-03-11T17:11:32Z Prediction of temperature offsets in the epitaxy process Yang, Xuan Wei Zhong Zhaowei School of Mechanical and Aerospace Engineering DRNTU::Engineering::Manufacturing 92 p. This research analyzes and evaluates the use of neural networks as a forecasting tool. Specifically a neural network's ability to predict the temperature offsets is tested. Temperature offsets are important control parameters in the semiconductor process. In the research, the neural network with back propagation learning algorithm is chosen to predict the temperature offsets based on the past observation. The prediction accuracy is compared against several forecasting methods, like multiple regression mode and radial basis function network. Master of Science (Computer Integrated Manufacturing) 2010-04-23T02:25:12Z 2010-04-23T02:25:12Z 2007 2007 Thesis http://hdl.handle.net/10356/36046 application/pdf |
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DRNTU::Engineering::Manufacturing Yang, Xuan Wei Prediction of temperature offsets in the epitaxy process |
description |
92 p. |
author2 |
Zhong Zhaowei |
author_facet |
Zhong Zhaowei Yang, Xuan Wei |
format |
Theses and Dissertations |
author |
Yang, Xuan Wei |
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Yang, Xuan Wei |
title |
Prediction of temperature offsets in the epitaxy process |
title_short |
Prediction of temperature offsets in the epitaxy process |
title_full |
Prediction of temperature offsets in the epitaxy process |
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Prediction of temperature offsets in the epitaxy process |
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Prediction of temperature offsets in the epitaxy process |
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prediction of temperature offsets in the epitaxy process |
publishDate |
2010 |
url |
http://hdl.handle.net/10356/36046 |
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1761781585959452672 |