Transparent thin film transistors by solution process

Thin film transistor (TFT) technologies have been the great force behind the development of display for the past few decades. In today’s display industry, TFT is still the backbone for Active Matrix Liquid Crystal Display (AMLCD) and Active Matrix Organic Light Emitting Diode (AMOLED). While silicon...

Full description

Saved in:
Bibliographic Details
Main Author: Chong, How Han.
Other Authors: Sun Xiaowei
Format: Final Year Project
Language:English
Published: 2010
Subjects:
Online Access:http://hdl.handle.net/10356/40748
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Nanyang Technological University
Language: English
id sg-ntu-dr.10356-40748
record_format dspace
spelling sg-ntu-dr.10356-407482023-07-07T15:49:26Z Transparent thin film transistors by solution process Chong, How Han. Sun Xiaowei School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Microelectronics Thin film transistor (TFT) technologies have been the great force behind the development of display for the past few decades. In today’s display industry, TFT is still the backbone for Active Matrix Liquid Crystal Display (AMLCD) and Active Matrix Organic Light Emitting Diode (AMOLED). While silicon based TFT is dominating the market, it possesses limitations, such as instability of threshold voltage and electron mobility. Furthermore, the fabrication cost of TFT with conventional methods is still very high, which make the price of displays a concern. Solution processed TFT is aimed to reduce the complexity and fabrication cost by means of simple and low cost methods. Moreover, materials with wide bandgap (transparent) and high mobility, such as zinc oxide were proved to be stable and can be processed at ambient conditions. Compare to silicon based material, zinc oxide based material has many advantages that are suitable for TFT. Thus, it possesses a great potential as an alternative to amorphous silicon as the active layer material in TFT. In this project, two solution processing methods will be discussed – spray pyrolysis and ink-jet printing. These methods are chosen for this project because they are simple, economical and use less chemical during fabrication. Therefore, it is worth to explore the feasibility to fabricate TFT using these two methods. Besides, pure zinc oxide (ZnO), indium zinc oxide (IZO) and indium gallium zinc oxide (IGZO) are used in the experiments to study the effect of indium and gallium in zinc oxide thin film and hence the device performance. Bottom gate top contact TFTs were fabricated using spray pyrolysis method and bottom gate bottom contact TFTs were fabricated using ink-jet printing method. Bachelor of Engineering 2010-06-21T06:34:49Z 2010-06-21T06:34:49Z 2010 2010 Final Year Project (FYP) http://hdl.handle.net/10356/40748 en Nanyang Technological University 59 p. application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
language English
topic DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
spellingShingle DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
Chong, How Han.
Transparent thin film transistors by solution process
description Thin film transistor (TFT) technologies have been the great force behind the development of display for the past few decades. In today’s display industry, TFT is still the backbone for Active Matrix Liquid Crystal Display (AMLCD) and Active Matrix Organic Light Emitting Diode (AMOLED). While silicon based TFT is dominating the market, it possesses limitations, such as instability of threshold voltage and electron mobility. Furthermore, the fabrication cost of TFT with conventional methods is still very high, which make the price of displays a concern. Solution processed TFT is aimed to reduce the complexity and fabrication cost by means of simple and low cost methods. Moreover, materials with wide bandgap (transparent) and high mobility, such as zinc oxide were proved to be stable and can be processed at ambient conditions. Compare to silicon based material, zinc oxide based material has many advantages that are suitable for TFT. Thus, it possesses a great potential as an alternative to amorphous silicon as the active layer material in TFT. In this project, two solution processing methods will be discussed – spray pyrolysis and ink-jet printing. These methods are chosen for this project because they are simple, economical and use less chemical during fabrication. Therefore, it is worth to explore the feasibility to fabricate TFT using these two methods. Besides, pure zinc oxide (ZnO), indium zinc oxide (IZO) and indium gallium zinc oxide (IGZO) are used in the experiments to study the effect of indium and gallium in zinc oxide thin film and hence the device performance. Bottom gate top contact TFTs were fabricated using spray pyrolysis method and bottom gate bottom contact TFTs were fabricated using ink-jet printing method.
author2 Sun Xiaowei
author_facet Sun Xiaowei
Chong, How Han.
format Final Year Project
author Chong, How Han.
author_sort Chong, How Han.
title Transparent thin film transistors by solution process
title_short Transparent thin film transistors by solution process
title_full Transparent thin film transistors by solution process
title_fullStr Transparent thin film transistors by solution process
title_full_unstemmed Transparent thin film transistors by solution process
title_sort transparent thin film transistors by solution process
publishDate 2010
url http://hdl.handle.net/10356/40748
_version_ 1772827485429301248