Preparation of silicon quantum dots
Silicon nanoparticle, typically when in the quantum dot region of less than 10nm, demonstrated unique properties in optical, electrical as well as catalytic properties. The Silicon nanoparticle has been proposed as a potential photocatalyst due to its relatively small band gap. It allows excitation...
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| Format: | Final Year Project |
| Language: | English |
| Published: |
2011
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| Online Access: | http://hdl.handle.net/10356/43680 |
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| Institution: | Nanyang Technological University |
| Language: | English |
| Summary: | Silicon nanoparticle, typically when in the quantum dot region of less than 10nm, demonstrated unique properties in optical, electrical as well as catalytic properties. The Silicon nanoparticle has been proposed as a potential photocatalyst due to its relatively small band gap. It allows excitation from wavelength that surpasses current catalyst. It has been shown that when Silicon nanoparticles are suspended in water under UV light, the nanoparticles will undergo photo-oxidation and generate hydrogen.[1] In this project however we are focusing on method of synthesizing the Silicon nanoparticle using two different method, namely chemical reduction method and etching method. We would investigate the Silicon nanoparticles synthesize by the different methods and compare the nanoparticles forms. |
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