Laser annealing of semiconductor materials for future electron device application
Laser annealing (LA) is an emerging technique that has the potential to be incorporated into the device fabrication process in the near future. The unique characteristics of LA that are not found in the conventional thermal annealing methods have gained substantial attraction for applications to the...
Saved in:
主要作者: | |
---|---|
其他作者: | |
格式: | Theses and Dissertations |
語言: | English |
出版: |
2011
|
主題: | |
在線閱讀: | http://hdl.handle.net/10356/43999 |
標簽: |
添加標簽
沒有標簽, 成為第一個標記此記錄!
|
機構: | Nanyang Technological University |
語言: | English |