Photoresists based on urethane acrylate mixed with fluoroacrylates

• Main Author: Chong, Joseph Rui Hong.
• Other Authors: Marc Jean Medard Abadie
• Format: Final Year Project
• Language: English
• Published: 2011
• Subjects: DRNTU::Engineering::Materials
• Online Access: http://hdl.handle.net/10356/44781
• Institution: Nanyang Technological University

Roll-to-roll UV embossing is a field with large commercial applications. This is due to the large amount of devices these days that necessitate the use of display technologies, which are highly dependent on the use of optical substrates. UV curing provide significant advantages in terms of large scale production, quick processing and low costs. In this report, a kinetics study was done on the curing of siliconized urethane acrylates, CN990 mixed with either 2,2,2-Trifluoroethyl acrylate(TFEA) or 2,2,3,3-Tetrafluoropropyl acrylate(TFPA) in varying ratios from 100:0, 90:10 to 0:100. A photoinitiator, Darocur® 1173, was added at 4wt% to the formulation. Experiments were done on the photo-differential scanning calorimetry(DPC) at different temperatures, and analysis of the results were done using Thermal Advantage® Specialty Library software. Analysis showed that for both formulations, the reaction rate increases as the ratio of monomer increases, up till around 70:30. The maximal reaction rate at 40 °C was also observed.