INSBN alloy and INSB nanowire grown by metal-organic chemical vapor deposition

InSb is a very special binary III-V semiconductor with important applications in infrared detectors, optoelectronics and magnetic field sensors. Attracted by the promising applications for long wavelength infrared range by incorporating a small amount of nitrogen, InSbN alloys were grown by Metal-or...

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Main Author: Jin, Yunjiang
Other Authors: Tang Xiaohong
Format: Theses and Dissertations
Language:English
Published: 2014
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Online Access:https://hdl.handle.net/10356/61032
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Institution: Nanyang Technological University
Language: English
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spelling sg-ntu-dr.10356-610322023-07-04T17:12:20Z INSBN alloy and INSB nanowire grown by metal-organic chemical vapor deposition Jin, Yunjiang Tang Xiaohong Zhang Dao Hua School of Electrical and Electronic Engineering DRNTU::Engineering::Electrical and electronic engineering::Nanoelectronics DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics InSb is a very special binary III-V semiconductor with important applications in infrared detectors, optoelectronics and magnetic field sensors. Attracted by the promising applications for long wavelength infrared range by incorporating a small amount of nitrogen, InSbN alloys were grown by Metal-organic chemical vapor deposition (MOCVD) and characterized with various techniques. The first part of this project deals with growth and characterization of the InSb1-xNx alloys, aiming to reduce the band gap of the alloy. InSb epitaxial layers on InSb substrate were firstly prepared by MOCVD and then the InSbN alloys. Their structural, electrical and optical properties were characterized. It is demonstrated that InSbN alloys can be prepared by MOCVD technique and the concentration of nitrogen in the alloys varies with the growth conditions, including growth temperature and N/(N+Sb) ratio. The effect of GaAs and GaSb substrates on InSbN alloys has also been investigated. The N incorporation, band gap reduction and N distribution of InSbN alloys on the two substrates have been studied carefully. The second part primarily focuses on the growth and characterization of InSb naowires. InSb nanowires were grown on both (100) and (111) InSb substrates under different conditions. Uniform vertical nanowires with high density were obtained on InSb (111) substrate and the growth mechanism was investigated. In addition, despite the large lattice mismatch, InSb nanowires were also successfully realized on GaAs and Si substrates and the growth mechanism was also discussed in detail. DOCTOR OF PHILOSOPHY (EEE) 2014-06-04T03:20:50Z 2014-06-04T03:20:50Z 2014 2014 Thesis Jin, Y. (2014). INSBN alloy and INSB nanowire grown by metal-organic chemical vapor deposition. Doctoral thesis, Nanyang Technological University, Singapore. https://hdl.handle.net/10356/61032 10.32657/10356/61032 en 179 p. application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
language English
topic DRNTU::Engineering::Electrical and electronic engineering::Nanoelectronics
DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics
spellingShingle DRNTU::Engineering::Electrical and electronic engineering::Nanoelectronics
DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics
Jin, Yunjiang
INSBN alloy and INSB nanowire grown by metal-organic chemical vapor deposition
description InSb is a very special binary III-V semiconductor with important applications in infrared detectors, optoelectronics and magnetic field sensors. Attracted by the promising applications for long wavelength infrared range by incorporating a small amount of nitrogen, InSbN alloys were grown by Metal-organic chemical vapor deposition (MOCVD) and characterized with various techniques. The first part of this project deals with growth and characterization of the InSb1-xNx alloys, aiming to reduce the band gap of the alloy. InSb epitaxial layers on InSb substrate were firstly prepared by MOCVD and then the InSbN alloys. Their structural, electrical and optical properties were characterized. It is demonstrated that InSbN alloys can be prepared by MOCVD technique and the concentration of nitrogen in the alloys varies with the growth conditions, including growth temperature and N/(N+Sb) ratio. The effect of GaAs and GaSb substrates on InSbN alloys has also been investigated. The N incorporation, band gap reduction and N distribution of InSbN alloys on the two substrates have been studied carefully. The second part primarily focuses on the growth and characterization of InSb naowires. InSb nanowires were grown on both (100) and (111) InSb substrates under different conditions. Uniform vertical nanowires with high density were obtained on InSb (111) substrate and the growth mechanism was investigated. In addition, despite the large lattice mismatch, InSb nanowires were also successfully realized on GaAs and Si substrates and the growth mechanism was also discussed in detail.
author2 Tang Xiaohong
author_facet Tang Xiaohong
Jin, Yunjiang
format Theses and Dissertations
author Jin, Yunjiang
author_sort Jin, Yunjiang
title INSBN alloy and INSB nanowire grown by metal-organic chemical vapor deposition
title_short INSBN alloy and INSB nanowire grown by metal-organic chemical vapor deposition
title_full INSBN alloy and INSB nanowire grown by metal-organic chemical vapor deposition
title_fullStr INSBN alloy and INSB nanowire grown by metal-organic chemical vapor deposition
title_full_unstemmed INSBN alloy and INSB nanowire grown by metal-organic chemical vapor deposition
title_sort insbn alloy and insb nanowire grown by metal-organic chemical vapor deposition
publishDate 2014
url https://hdl.handle.net/10356/61032
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