Reflectance & surface morphology study of diamond wire cut silicon wafers for solar cells

The silicon wafers for solar cells are generally sawn by two processes namely fixed abrasive diamond wire (FAW) and loose abrasive wire (LAW) sawn. The fixed abrasive diamond wire (FAW) sawing produces a smoother sawn wafer surface compared to the loose abrasive wire (LAW) sawn wafer. The l...

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Main Author: Gautham Ravi Srinivas
Other Authors: David Lee Butler
Format: Theses and Dissertations
Language:English
Published: 2015
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Online Access:http://hdl.handle.net/10356/64888
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Institution: Nanyang Technological University
Language: English
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spelling sg-ntu-dr.10356-648882023-03-11T17:00:34Z Reflectance & surface morphology study of diamond wire cut silicon wafers for solar cells Gautham Ravi Srinivas David Lee Butler School of Mechanical and Aerospace Engineering DRNTU::Engineering::Aeronautical engineering::Materials of construction The silicon wafers for solar cells are generally sawn by two processes namely fixed abrasive diamond wire (FAW) and loose abrasive wire (LAW) sawn. The fixed abrasive diamond wire (FAW) sawing produces a smoother sawn wafer surface compared to the loose abrasive wire (LAW) sawn wafer. The literature study has shown that it is not possible to obtain the required surface morphology in diamond wire sawn wafers by using the existing wet etching protocol due to the presence of a potential mask which is the amorphous phase silicon [1]. Therefore, it is important to etch away the amorphous silicon to achieve the required roughness and thereby reducing the reflectance. This project focuses on the removal of the amorphous phase silicon by anisotropic etching with potassium hydroxide (K.OH) followed by acidic etching with Buffered Oxide Etch (BOE) and isotropic etching contours. The acidic etching is done to bring the texture on the wafer surface. In all the experiments conducted etching time is considered as a key parameter [2]. Micrograph analysis of the etched wafer shows that when the wafers are etched for a long period of time the texture diminishes. Hence it is important to have a time dependent etching of KOH to wash away the amorphous phase silicon and obtain the required texture. Raman spectra of the as-cut wafer before texturing consist of crystalline phase silicon and amorphous silicon (a potential mask) [2]. In this project, the amorphous phase silicon is successfully removed and the surface morphology of the diamond wire sawn wafers is improved using KOH followed by acidic etching. It is elucidated and evident that etching for shorter time period gives favorable texture on the diamond wire sawn wafer so that light absorption is expected to increase. Master of Science 2015-06-09T03:24:26Z 2015-06-09T03:24:26Z 2014 2014 Thesis http://hdl.handle.net/10356/64888 en 135 p. application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
language English
topic DRNTU::Engineering::Aeronautical engineering::Materials of construction
spellingShingle DRNTU::Engineering::Aeronautical engineering::Materials of construction
Gautham Ravi Srinivas
Reflectance & surface morphology study of diamond wire cut silicon wafers for solar cells
description The silicon wafers for solar cells are generally sawn by two processes namely fixed abrasive diamond wire (FAW) and loose abrasive wire (LAW) sawn. The fixed abrasive diamond wire (FAW) sawing produces a smoother sawn wafer surface compared to the loose abrasive wire (LAW) sawn wafer. The literature study has shown that it is not possible to obtain the required surface morphology in diamond wire sawn wafers by using the existing wet etching protocol due to the presence of a potential mask which is the amorphous phase silicon [1]. Therefore, it is important to etch away the amorphous silicon to achieve the required roughness and thereby reducing the reflectance. This project focuses on the removal of the amorphous phase silicon by anisotropic etching with potassium hydroxide (K.OH) followed by acidic etching with Buffered Oxide Etch (BOE) and isotropic etching contours. The acidic etching is done to bring the texture on the wafer surface. In all the experiments conducted etching time is considered as a key parameter [2]. Micrograph analysis of the etched wafer shows that when the wafers are etched for a long period of time the texture diminishes. Hence it is important to have a time dependent etching of KOH to wash away the amorphous phase silicon and obtain the required texture. Raman spectra of the as-cut wafer before texturing consist of crystalline phase silicon and amorphous silicon (a potential mask) [2]. In this project, the amorphous phase silicon is successfully removed and the surface morphology of the diamond wire sawn wafers is improved using KOH followed by acidic etching. It is elucidated and evident that etching for shorter time period gives favorable texture on the diamond wire sawn wafer so that light absorption is expected to increase.
author2 David Lee Butler
author_facet David Lee Butler
Gautham Ravi Srinivas
format Theses and Dissertations
author Gautham Ravi Srinivas
author_sort Gautham Ravi Srinivas
title Reflectance & surface morphology study of diamond wire cut silicon wafers for solar cells
title_short Reflectance & surface morphology study of diamond wire cut silicon wafers for solar cells
title_full Reflectance & surface morphology study of diamond wire cut silicon wafers for solar cells
title_fullStr Reflectance & surface morphology study of diamond wire cut silicon wafers for solar cells
title_full_unstemmed Reflectance & surface morphology study of diamond wire cut silicon wafers for solar cells
title_sort reflectance & surface morphology study of diamond wire cut silicon wafers for solar cells
publishDate 2015
url http://hdl.handle.net/10356/64888
_version_ 1761781648272130048