Reflectance & surface morphology study of diamond wire cut silicon wafers for solar cells
The silicon wafers for solar cells are generally sawn by two processes namely fixed abrasive diamond wire (FAW) and loose abrasive wire (LAW) sawn. The fixed abrasive diamond wire (FAW) sawing produces a smoother sawn wafer surface compared to the loose abrasive wire (LAW) sawn wafer. The l...
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sg-ntu-dr.10356-648882023-03-11T17:00:34Z Reflectance & surface morphology study of diamond wire cut silicon wafers for solar cells Gautham Ravi Srinivas David Lee Butler School of Mechanical and Aerospace Engineering DRNTU::Engineering::Aeronautical engineering::Materials of construction The silicon wafers for solar cells are generally sawn by two processes namely fixed abrasive diamond wire (FAW) and loose abrasive wire (LAW) sawn. The fixed abrasive diamond wire (FAW) sawing produces a smoother sawn wafer surface compared to the loose abrasive wire (LAW) sawn wafer. The literature study has shown that it is not possible to obtain the required surface morphology in diamond wire sawn wafers by using the existing wet etching protocol due to the presence of a potential mask which is the amorphous phase silicon [1]. Therefore, it is important to etch away the amorphous silicon to achieve the required roughness and thereby reducing the reflectance. This project focuses on the removal of the amorphous phase silicon by anisotropic etching with potassium hydroxide (K.OH) followed by acidic etching with Buffered Oxide Etch (BOE) and isotropic etching contours. The acidic etching is done to bring the texture on the wafer surface. In all the experiments conducted etching time is considered as a key parameter [2]. Micrograph analysis of the etched wafer shows that when the wafers are etched for a long period of time the texture diminishes. Hence it is important to have a time dependent etching of KOH to wash away the amorphous phase silicon and obtain the required texture. Raman spectra of the as-cut wafer before texturing consist of crystalline phase silicon and amorphous silicon (a potential mask) [2]. In this project, the amorphous phase silicon is successfully removed and the surface morphology of the diamond wire sawn wafers is improved using KOH followed by acidic etching. It is elucidated and evident that etching for shorter time period gives favorable texture on the diamond wire sawn wafer so that light absorption is expected to increase. Master of Science 2015-06-09T03:24:26Z 2015-06-09T03:24:26Z 2014 2014 Thesis http://hdl.handle.net/10356/64888 en 135 p. application/pdf |
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DRNTU::Engineering::Aeronautical engineering::Materials of construction Gautham Ravi Srinivas Reflectance & surface morphology study of diamond wire cut silicon wafers for solar cells |
description |
The silicon wafers for solar cells are generally sawn by two processes namely fixed abrasive
diamond wire (FAW) and loose abrasive wire (LAW) sawn. The fixed
abrasive diamond wire (FAW) sawing produces a smoother sawn wafer surface
compared to the loose abrasive wire (LAW) sawn wafer. The literature study has
shown that it is not possible to obtain the required surface morphology in diamond
wire sawn wafers by using the existing wet etching protocol due to the presence of a
potential mask which is the amorphous phase silicon [1]. Therefore, it is important
to etch away the amorphous silicon to achieve the required roughness and thereby
reducing the reflectance. This project focuses on the removal of the amorphous
phase silicon by anisotropic etching with potassium hydroxide (K.OH) followed by
acidic etching with Buffered Oxide Etch (BOE) and isotropic etching contours. The
acidic etching is done to bring the texture on the wafer surface. In all the
experiments conducted etching time is considered as a key parameter [2].
Micrograph analysis of the etched wafer shows that when the wafers are etched for
a long period of time the texture diminishes. Hence it is important to have a time
dependent etching of KOH to wash away the amorphous phase silicon and obtain
the required texture. Raman spectra of the as-cut wafer before texturing consist of
crystalline phase silicon and amorphous silicon (a potential mask) [2]. In this
project, the amorphous phase silicon is successfully removed and the surface
morphology of the diamond wire sawn wafers is improved using KOH followed by
acidic etching. It is elucidated and evident that etching for shorter time period gives
favorable texture on the diamond wire sawn wafer so that light absorption is
expected to increase. |
author2 |
David Lee Butler |
author_facet |
David Lee Butler Gautham Ravi Srinivas |
format |
Theses and Dissertations |
author |
Gautham Ravi Srinivas |
author_sort |
Gautham Ravi Srinivas |
title |
Reflectance & surface morphology study of diamond wire cut silicon wafers for solar cells |
title_short |
Reflectance & surface morphology study of diamond wire cut silicon wafers for solar cells |
title_full |
Reflectance & surface morphology study of diamond wire cut silicon wafers for solar cells |
title_fullStr |
Reflectance & surface morphology study of diamond wire cut silicon wafers for solar cells |
title_full_unstemmed |
Reflectance & surface morphology study of diamond wire cut silicon wafers for solar cells |
title_sort |
reflectance & surface morphology study of diamond wire cut silicon wafers for solar cells |
publishDate |
2015 |
url |
http://hdl.handle.net/10356/64888 |
_version_ |
1761781648272130048 |