Degradation of sulfanomides in water using direct UV photolysis and UV/PS processes

The presence of residual antibiotics in water has sparked an increased social concern, where it is classified as a rapidly growing class of contaminants. The adverse effects have been associated with its rising incidence of antibiotic-resistant genes and bacteria. In particular sulfonamides (SAs) ha...

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Main Author: Peh, Anthony Young Siang
Other Authors: Lim Teik Thye
Format: Final Year Project
Language:English
Published: 2017
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Online Access:http://hdl.handle.net/10356/72943
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Institution: Nanyang Technological University
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spelling sg-ntu-dr.10356-729432023-03-03T17:10:49Z Degradation of sulfanomides in water using direct UV photolysis and UV/PS processes Peh, Anthony Young Siang Lim Teik Thye School of Civil and Environmental Engineering DRNTU::Engineering::Environmental engineering The presence of residual antibiotics in water has sparked an increased social concern, where it is classified as a rapidly growing class of contaminants. The adverse effects have been associated with its rising incidence of antibiotic-resistant genes and bacteria. In particular sulfonamides (SAs) have been a commonly used antibiotic for treating human diseases and as veterinary medicine. Fifteen SAs were chosen as target pollutants in this project. Their photodegradation rates were investigated using a low-pressure UV-254 Hg lamp by direct UV photolysis and UV/persulfate (UV/PS) processes. Removal of SAs under direct UV photolysis processes is inefficient due to their low quantum yield, while the photodegradation of SAs significantly increases with the addition of persulfate in the UV/PS system due to the generation of sulfate radicals. A ratio of 20:1 [oxidant/pollutant] was applied in this study. As compared to the maximum removal of 50% by direct UV photolysis for up to an hour, UV/PS system demonstrates a maximum removal efficiency of 98% for merely 7 minutes. A comparison was made between UV/PS and UV/H2O2 processes with the same oxidant to pollutant ratio. The determined second-order rate constants of radicals with SAs show that UV/PS is more efficient than UV/H2O2 in degrading SAs. Quantitative structure activity relationship (QSAR) model was then developed using twelve quantum-chemical descriptors to correlate the photodegradation rate and the structural characteristics of SAs. Due to the larger independent variables of Fukui indices and qH+, they are considered as the key parameters in the optimal model for direct UV photolysis. QSAR model was also developed with the first-order rate constant by UV/PS process. Fukui indices, Ehomo and Elumo are considered as the key parameters in the regression model due to a higher independent variable. Bachelor of Engineering (Environmental Engineering) 2017-12-13T07:03:27Z 2017-12-13T07:03:27Z 2017 Final Year Project (FYP) http://hdl.handle.net/10356/72943 en Nanyang Technological University 41 p. application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
language English
topic DRNTU::Engineering::Environmental engineering
spellingShingle DRNTU::Engineering::Environmental engineering
Peh, Anthony Young Siang
Degradation of sulfanomides in water using direct UV photolysis and UV/PS processes
description The presence of residual antibiotics in water has sparked an increased social concern, where it is classified as a rapidly growing class of contaminants. The adverse effects have been associated with its rising incidence of antibiotic-resistant genes and bacteria. In particular sulfonamides (SAs) have been a commonly used antibiotic for treating human diseases and as veterinary medicine. Fifteen SAs were chosen as target pollutants in this project. Their photodegradation rates were investigated using a low-pressure UV-254 Hg lamp by direct UV photolysis and UV/persulfate (UV/PS) processes. Removal of SAs under direct UV photolysis processes is inefficient due to their low quantum yield, while the photodegradation of SAs significantly increases with the addition of persulfate in the UV/PS system due to the generation of sulfate radicals. A ratio of 20:1 [oxidant/pollutant] was applied in this study. As compared to the maximum removal of 50% by direct UV photolysis for up to an hour, UV/PS system demonstrates a maximum removal efficiency of 98% for merely 7 minutes. A comparison was made between UV/PS and UV/H2O2 processes with the same oxidant to pollutant ratio. The determined second-order rate constants of radicals with SAs show that UV/PS is more efficient than UV/H2O2 in degrading SAs. Quantitative structure activity relationship (QSAR) model was then developed using twelve quantum-chemical descriptors to correlate the photodegradation rate and the structural characteristics of SAs. Due to the larger independent variables of Fukui indices and qH+, they are considered as the key parameters in the optimal model for direct UV photolysis. QSAR model was also developed with the first-order rate constant by UV/PS process. Fukui indices, Ehomo and Elumo are considered as the key parameters in the regression model due to a higher independent variable.
author2 Lim Teik Thye
author_facet Lim Teik Thye
Peh, Anthony Young Siang
format Final Year Project
author Peh, Anthony Young Siang
author_sort Peh, Anthony Young Siang
title Degradation of sulfanomides in water using direct UV photolysis and UV/PS processes
title_short Degradation of sulfanomides in water using direct UV photolysis and UV/PS processes
title_full Degradation of sulfanomides in water using direct UV photolysis and UV/PS processes
title_fullStr Degradation of sulfanomides in water using direct UV photolysis and UV/PS processes
title_full_unstemmed Degradation of sulfanomides in water using direct UV photolysis and UV/PS processes
title_sort degradation of sulfanomides in water using direct uv photolysis and uv/ps processes
publishDate 2017
url http://hdl.handle.net/10356/72943
_version_ 1759855405170688000