Investigation of atomic layer deposited thin film for protection of BiVO4 photo-anodes in photoelectric cells

The ongoing demand for clean energy means we have to find ways to produce this energy and photo-electrical chemical cells (PEC) is an attractive method to produce hydrogen fuel from solar energy. BiVO4 is a suitable material used for the photo-anode in the PEC method due to its good band gap and cha...

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Main Author: Kumaresan, Heeran
Other Authors: Thirumany Sritharan
Format: Final Year Project
Language:English
Published: 2018
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Online Access:http://hdl.handle.net/10356/73890
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Institution: Nanyang Technological University
Language: English
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spelling sg-ntu-dr.10356-738902023-03-04T15:43:19Z Investigation of atomic layer deposited thin film for protection of BiVO4 photo-anodes in photoelectric cells Kumaresan, Heeran Thirumany Sritharan School of Materials Science and Engineering DRNTU::Engineering::Materials The ongoing demand for clean energy means we have to find ways to produce this energy and photo-electrical chemical cells (PEC) is an attractive method to produce hydrogen fuel from solar energy. BiVO4 is a suitable material used for the photo-anode in the PEC method due to its good band gap and charge transport properties. However, photo-corrosion is a big problem and this degradation problem reduces the stability of the photo-anode which subsequently reduces the performance capability and efficiency of the hydrogen fuel production. To combat this photo-corrosion problem, a protective layer over the photo-anode is needed and this layer should have sufficient charge transport properties to allow the diffusion of electrons and holes besides being transparent to light. Hence, we chose to evaluate TiO2 deposited by atomic layer deposition as a protective layer for Mo-BiVO4 photo-anode whose performance was evaluated in a PEC setup in the laboratory. Firstly, after comparing the data obtained from linear sweep voltammetry method, the photocurrent density increases with increasing applied voltage after illumination. However, for a sample coated with TiO2, the amount of photocurrent generated is slightly lower compared to a sample that is not coated with TiO2 at a particular voltage. This was due to extra energy having to penetrate the layer of TiO2 which would result in lesser number of electrons and holes generated for transport. Next, we used a chronoamperometry scan to determine the stability of the photo-anode. We analysed both the TiO2 coated sample and non-TiO2 coated sample and found that there was no depreciation in photocurrent density with respect to time for the coated sample. However, the photocurrent density depreciated significantly with time for the non-coated sample, concluding that TiO2 is indeed an effective protective layer for photo-corrosion. Understanding the protective mechanism of TiO2 and evaluating the data obtained is important to determine the suitability of TiO2 for this application. Bachelor of Engineering (Materials Engineering) 2018-04-19T00:49:49Z 2018-04-19T00:49:49Z 2018 Final Year Project (FYP) http://hdl.handle.net/10356/73890 en Nanyang Technological University 31 p. application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
language English
topic DRNTU::Engineering::Materials
spellingShingle DRNTU::Engineering::Materials
Kumaresan, Heeran
Investigation of atomic layer deposited thin film for protection of BiVO4 photo-anodes in photoelectric cells
description The ongoing demand for clean energy means we have to find ways to produce this energy and photo-electrical chemical cells (PEC) is an attractive method to produce hydrogen fuel from solar energy. BiVO4 is a suitable material used for the photo-anode in the PEC method due to its good band gap and charge transport properties. However, photo-corrosion is a big problem and this degradation problem reduces the stability of the photo-anode which subsequently reduces the performance capability and efficiency of the hydrogen fuel production. To combat this photo-corrosion problem, a protective layer over the photo-anode is needed and this layer should have sufficient charge transport properties to allow the diffusion of electrons and holes besides being transparent to light. Hence, we chose to evaluate TiO2 deposited by atomic layer deposition as a protective layer for Mo-BiVO4 photo-anode whose performance was evaluated in a PEC setup in the laboratory. Firstly, after comparing the data obtained from linear sweep voltammetry method, the photocurrent density increases with increasing applied voltage after illumination. However, for a sample coated with TiO2, the amount of photocurrent generated is slightly lower compared to a sample that is not coated with TiO2 at a particular voltage. This was due to extra energy having to penetrate the layer of TiO2 which would result in lesser number of electrons and holes generated for transport. Next, we used a chronoamperometry scan to determine the stability of the photo-anode. We analysed both the TiO2 coated sample and non-TiO2 coated sample and found that there was no depreciation in photocurrent density with respect to time for the coated sample. However, the photocurrent density depreciated significantly with time for the non-coated sample, concluding that TiO2 is indeed an effective protective layer for photo-corrosion. Understanding the protective mechanism of TiO2 and evaluating the data obtained is important to determine the suitability of TiO2 for this application.
author2 Thirumany Sritharan
author_facet Thirumany Sritharan
Kumaresan, Heeran
format Final Year Project
author Kumaresan, Heeran
author_sort Kumaresan, Heeran
title Investigation of atomic layer deposited thin film for protection of BiVO4 photo-anodes in photoelectric cells
title_short Investigation of atomic layer deposited thin film for protection of BiVO4 photo-anodes in photoelectric cells
title_full Investigation of atomic layer deposited thin film for protection of BiVO4 photo-anodes in photoelectric cells
title_fullStr Investigation of atomic layer deposited thin film for protection of BiVO4 photo-anodes in photoelectric cells
title_full_unstemmed Investigation of atomic layer deposited thin film for protection of BiVO4 photo-anodes in photoelectric cells
title_sort investigation of atomic layer deposited thin film for protection of bivo4 photo-anodes in photoelectric cells
publishDate 2018
url http://hdl.handle.net/10356/73890
_version_ 1759856484355670016