Time-frequency representation as a tool of failure detection

• Main Author: Soeryanto, Yehezkiel
• Other Authors: Tegoeh Tjahjowidodo
• Format: Final Year Project
• Language: English
• Published: 2019
• Subjects: DRNTU::Engineering::Mechanical engineering::Mechatronics
• Online Access: http://hdl.handle.net/10356/78702
• Institution: Nanyang Technological University

Chemical-Mechanical Planarization, or CMP for short, is one of the final major process involved in semiconductor company when making a microchip. In this process the chip is being made perfectly smooth and flat with the help of chemical and mechanical forces. The tool which does the planarizing proc...