Subwavelength interference lithography based on a unidirectional surface plasmon coupler

• Main Authors: Zhang, Shuxia, Zhang, Dao Hua, Wang, Yueke, Wang, Jian, Yang, Xuefeng
• Other Authors: School of Electrical and Electronic Engineering
• Format: Article
• Language: English
• Published: 2015
• Subjects: DRNTU::Engineering::Electrical and electronic engineering::Antennas, wave guides, microwaves, radar, radio; DRNTU::Engineering::Electrical and electronic engineering::Optics, optoelectronics, photonics
• Online Access: https://hdl.handle.net/10356/79423; http://hdl.handle.net/10220/25326
• Institution: Nanyang Technological University

A subwavelength interference lithography method is numerically demonstrated based on surface plasmon polaritons excited by unidirectional couplers, and the unidirectional coupler is composed of a conventional nanoslit with a nanochannel excavated from one side of this nanoslit. Simulation results sh...