Real Time Monitoring Of Exposure Controlled Projection Lithography

• Main Authors: Zhao, Changxuan, Jariwala, Amit S., Rosen, David W.
• Other Authors: School of Mechanical and Aerospace Engineering
• Format: Conference or Workshop Item
• Language: English
• Published: 2016
• Online Access: https://hdl.handle.net/10356/84379; http://hdl.handle.net/10220/41771
• Institution: Nanyang Technological University

Exposure Controlled Projection Lithography (ECPL) is a stereolithographic process in which lens shaped features are fabricated from Photopolymer resin. During the fabrication process, a dynamic mask is used to control and project radiation patterns through a transparent substrate onto the photopolym...