Nanoscale phase engineering of niobium diselenide
With the continuing miniaturization of semiconductor microelectronics, atomically thin materials are emerging as promising candidate materials for future ultrascale electronics. In particular, the layered transition metal dichalcogenides (TMDs) have attracted a significant amount of attention becaus...
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sg-ntu-dr.10356-865782023-02-28T19:33:58Z Nanoscale phase engineering of niobium diselenide Bischoff, Felix Auwärter, Willi Barth, Johannes V. Schiffrin, Agustin Fuhrer, Michael Weber, Bent School of Physical and Mathematical Sciences DRNTU::Science::Physics Transition Metal Dichalcogenide Niobium Diselenide With the continuing miniaturization of semiconductor microelectronics, atomically thin materials are emerging as promising candidate materials for future ultrascale electronics. In particular, the layered transition metal dichalcogenides (TMDs) have attracted a significant amount of attention because of the variety of their electronic properties, depending on the type of transition metal and its coordination within the crystal. Here, we use low-temperature scanning tunneling microscopy (STM) for the structural and electronic phase engineering of the group V TMD niobium diselenide (NbSe2). By applying voltage pulses with an STM tip, we can transform the material crystal phase locally from trigonal prismatic (2H) to octahedral (1T), as confirmed by the concomitant emergence of a characteristic (√13 × √13)R13.9° charge density wave (CDW) order. At 77 K, atomic-resolution STM images of the junction with sublattice detail confirm the successful phase engineering of the material, as we resolve the difference in the Nb coordination evidenced by a slip of the top Se plane. Different 1T-CDW intensities suggest interlayer interactions to be present in 1T-NbSe2. Furthermore, a distinct voltage dependence suggests a complex CDW mechanism that does not just rely on a star-of-David reconstruction as in the case of other 1T-TMDs. Additionally, bias pulses cause surface modifications inducing local lattice strain that favors a one-dimensional charge order over the intrinsic 3 × 3 CDW at 4.5 K for 2H-NbSe2, which can be reversibly manipulated by STM. NRF (Natl Research Foundation, S’pore) Accepted version 2019-05-22T03:53:56Z 2019-12-06T16:25:07Z 2019-05-22T03:53:56Z 2019-12-06T16:25:07Z 2017 Journal Article Bischoff, F., Auwärter, W., Barth, J. V., Schiffrin, A., Fuhrer, M., & Weber, B. (2017). Nanoscale phase engineering of niobium diselenide. Chemistry of Materials, 29(23), 9907-9914. doi:10.1021/acs.chemmater.7b03061 0897-4756 https://hdl.handle.net/10356/86578 http://hdl.handle.net/10220/48313 10.1021/acs.chemmater.7b03061 en Chemistry of Materials Chemistry of Materials © 2017 American Chemical Society. This document is the Accepted Manuscript version of a Published Work that appeared in final form in Chemistry of Materials, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see https://doi.org/10.1021/acs.chemmater.7b03061 7 p. application/pdf |
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DRNTU::Science::Physics Transition Metal Dichalcogenide Niobium Diselenide Bischoff, Felix Auwärter, Willi Barth, Johannes V. Schiffrin, Agustin Fuhrer, Michael Weber, Bent Nanoscale phase engineering of niobium diselenide |
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With the continuing miniaturization of semiconductor microelectronics, atomically thin materials are emerging as promising candidate materials for future ultrascale electronics. In particular, the layered transition metal dichalcogenides (TMDs) have attracted a significant amount of attention because of the variety of their electronic properties, depending on the type of transition metal and its coordination within the crystal. Here, we use low-temperature scanning tunneling microscopy (STM) for the structural and electronic phase engineering of the group V TMD niobium diselenide (NbSe2). By applying voltage pulses with an STM tip, we can transform the material crystal phase locally from trigonal prismatic (2H) to octahedral (1T), as confirmed by the concomitant emergence of a characteristic (√13 × √13)R13.9° charge density wave (CDW) order. At 77 K, atomic-resolution STM images of the junction with sublattice detail confirm the successful phase engineering of the material, as we resolve the difference in the Nb coordination evidenced by a slip of the top Se plane. Different 1T-CDW intensities suggest interlayer interactions to be present in 1T-NbSe2. Furthermore, a distinct voltage dependence suggests a complex CDW mechanism that does not just rely on a star-of-David reconstruction as in the case of other 1T-TMDs. Additionally, bias pulses cause surface modifications inducing local lattice strain that favors a one-dimensional charge order over the intrinsic 3 × 3 CDW at 4.5 K for 2H-NbSe2, which can be reversibly manipulated by STM. |
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School of Physical and Mathematical Sciences |
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School of Physical and Mathematical Sciences Bischoff, Felix Auwärter, Willi Barth, Johannes V. Schiffrin, Agustin Fuhrer, Michael Weber, Bent |
format |
Article |
author |
Bischoff, Felix Auwärter, Willi Barth, Johannes V. Schiffrin, Agustin Fuhrer, Michael Weber, Bent |
author_sort |
Bischoff, Felix |
title |
Nanoscale phase engineering of niobium diselenide |
title_short |
Nanoscale phase engineering of niobium diselenide |
title_full |
Nanoscale phase engineering of niobium diselenide |
title_fullStr |
Nanoscale phase engineering of niobium diselenide |
title_full_unstemmed |
Nanoscale phase engineering of niobium diselenide |
title_sort |
nanoscale phase engineering of niobium diselenide |
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2019 |
url |
https://hdl.handle.net/10356/86578 http://hdl.handle.net/10220/48313 |
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