Controlled synthesis of atomically layered hexagonal boron nitride via chemical vapor deposition

• Main Authors: Liu, Juanjuan, Liu, Zheng, Kutty, Rajendrannair Govindan
• Other Authors: School of Materials Science & Engineering
• Format: Article
• Language: English
• Published: 2018
• Subjects: Chemical Vapor Deposition; Hexagonal Boron Nitride; DRNTU::Engineering::Materials
• Online Access: https://hdl.handle.net/10356/89553; http://hdl.handle.net/10220/46274
• Institution: Nanyang Technological University

Hexagonal boron nitrite (h-BN) is an attractive material for many applications including electronics as a complement to graphene, anti-oxidation coatings, light emitters, etc. However, the synthesis of high-quality h-BN is still a great challenge. In this work, via controlled chemical vapor deposition, we demonstrate the synthesis of h-BN films with a controlled thickness down to atomic layers. The quality of as-grown h-BN is confirmed by complementary characterizations including high-resolution transition electron microscopy, atomic force microscopy, Raman spectroscopy and X-ray photo-electron spectroscopy. This work will pave the way for production of large-scale and high-quality h-BN and its applications as well.