Kinetics of stop-flow atomic layer deposition for high aspect ratio template filling through photonic band gap measurements

• المؤلفون الرئيسيون: Karuturi, Siva Krishna, Liu, Lijun, Su, Liap Tat, Zhao, Yang, Fan, Hong Jin, Ge, Xiaochen, He, Sailing, Tok, Alfred Iing Yoong
• مؤلفون آخرون: School of Materials Science & Engineering
• التنسيق: مقال
• اللغة: English
• منشور في: 2011
• الموضوعات: DRNTU::Engineering::Materials::Photonics and optoelectronics materials
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/91348; http://hdl.handle.net/10220/7416

Atomic layer deposition (ALD) is shown as a unique method to produce high aspect ratio (AR) nanostructures through conformal filling and replication of high AR templates. The stop-flow process is often used as an alternative to the conventional continuous flow process to obtain high step coverage. H...