Kinetics of stop-flow atomic layer deposition for high aspect ratio template filling through photonic band gap measurements

Atomic layer deposition (ALD) is shown as a unique method to produce high aspect ratio (AR) nanostructures through conformal filling and replication of high AR templates. The stop-flow process is often used as an alternative to the conventional continuous flow process to obtain high step coverage. H...

Full description

Saved in:
Bibliographic Details
Main Authors: Karuturi, Siva Krishna, Liu, Lijun, Su, Liap Tat, Zhao, Yang, Fan, Hong Jin, Ge, Xiaochen, He, Sailing, Tok, Alfred Iing Yoong
Other Authors: School of Materials Science & Engineering
Format: Article
Language:English
Published: 2011
Subjects:
Online Access:https://hdl.handle.net/10356/91348
http://hdl.handle.net/10220/7416
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: Nanyang Technological University
Language: English

Similar Items